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For surface profilomery and measurements of film thickness by using an interferometer, the phase change on reflected light from a surface or at an interface between two media is inevitable. This leads to measurement errors of order of several tens of nanometers. Accordingly it is very important to make clear the phase change on a reflected light in dependence on surface characteristics of samples. We have developed the instrument for measuring the phase change and evaluated the surface form of sample evaporated with different kind of materials. By using this instrument, we measured the phase change on samples of Au, Al, Ag and Cr evaporated film for five kinds of wavelength from 442 to 633nm, in the reference of glass-air where the phase change is zero. If the phase change is converted to a length change, a length change corresponds to the value of 12`52nm and is large in nanometer measurements.
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